Warren Montgomery Joins Irresistible Materials to Drive the Commercialization of EUV Resists

BIRMINGHAM, UK and Weswood, Mass. — Feb. 09, 2017 — Irresistible Materials (IM), a UK materials technology company spun-out from the University of Birmingham, announced today that Warren Montgomery has joined IM as Vice President of Product Strategy & Commercialization. In the new role, Warren will be instrumental in guiding the successful commercial launch of IM’s resist products.

Warren Montgomery joins IM from the College of NanoScale Science and Engineering (CNSE) in Albany NY, where he was Assistant Vice President of Technical and Consortia Program Development. Warren was the first CNSE assignee to SEMATECH in the role of Resist and Materials Development Center Manager. Prior to CNSE, Warren worked at Applied Materials, LSI Logic, ASML, AZ Microelectronic and IBM in various technical and leadership roles. During his extensive career in Lithography, Warren has written over fifty technical publications and has been awarded 30 US and European patents.

On joining IM, Warren Montgomery said, “EUV lithography is moving toward high-volume manufacturing (HVM) for advanced semiconductor chip production. A key need continues to be high performance photoresists. Irresistible Materials (IM) has developed a low cost of ownership, high resolution, and low dose photoresist that represents a new and exciting approach to HVM patterning. I am looking forward, with great enthusiasm, to this opportunity to work with the IM team to help commercialize this exciting technology.”

Mark Shepherd, CEO of IM, said, “We are delighted to welcome Warren to Irresistible Materials.  His expertise and experience in our industry gives valuable depth to our expanding team that includes our key development partner and chemicals supplier, Nano-C, Inc.  These have been important steps in building our capabilities over recent months and Irresistible Materials is now well placed to bring its cutting edge resist and hard mask products to the market place in time for the introduction of EUV lithography”.

About Irresistible Materials

IM was created in 2010 to further develop and commercialise the University of Birmingham’s lithographic materials technology for the next generation of microchips.  Since launch, IM has developed an extensive patent portfolio covering innovative resist (EUV and E-beam) and hard-mask materials. It continues to work closely with the University, alongside a growing network of partners and collaborators worldwide to both develop and commercialize its materials portfolio. For more information, visit: www.irresistiblematerials.com.

 

About Nano-C, Inc.

Located in Westwood, Massachusetts, Nano-C is a leading developer of nanostructured carbon for use in energy and electronics applications. These materials include fullerenes, carbon nanotubes and their chemical derivatives. Nano-C’s mission is to play a key role in enabling applications of these materials and is committed to their responsible development and use. Nano-C is a privately held company founded in 2001. For more information, visit: http://www.nano-c.com/.
 
Contacts:

Mark Shepherd
Irresistible Materials
E-mail: mshepherd@irresistiblematerials.com

Viktor Vejins
Nano-C, Inc.
E-mail: nanocinfo@nano-c.com

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